Description
The SlurriGard™ DUO3 is a breakthrough CMP Filter Design that caters to advanced CMP processes in Point-of-Use CMP Tools. The DUO3 has a Upstream 3D Melt-Blown layer and a Downstream Wrapped Nano Fibre layer. Disruptive particles like gels and agglomerates will be effectively captured at the Upstream layers while the Downstream layers provide for optimized retention of fine contaminants while allowing working slurry particles to come through with ease. This effectively reduced defect causing particles reaching the wafer while delivering consistent removal rates. An optimised outcome is therefore achieved with high LPC retention, low delta pressure and longer filter life time on any slurry type of ceria, colloidal or fumed silica.
The Mycropore CMP Product Management team can assist you in the application of a suitable and effective CMP filter that will meet the desired outcomes of your CMP process. We have proven experience in CMP Point-of-Use Tool applications for technology nodes for 5nm and above.
