Products
Chemical Mechanical Planarization
Facility Delivery System / Slurry Manufacturing
SlurriGard™ DUO3, PDT_, PSB Series
Features: Patented DUO3 technology, high performance, low DP, long life. Patented IPWETTM technology improves LPC 2X, fast start-up. Advanced 200nm HiPoroTM nano-fiber
Benefits: Low metal extractable. Mass production proven at leading foundries, memory fabs, slurry makers. 10in, 20in, 30in cartridge filters
Additional Information: -
Options: 0.05um, 0.07um, 0.1um, 0.2um, 0.3um, 0.5um, 0.7um, 1um, 3um, 5um, 7um, 9um
Equipment - POU (Point of Use Filter)
SlurriGard™ DUO3, PDT_, PSB Series
Features: Improves particle retention, Faster start-up, Slurry savings
Benefits: Process improvement, Cost Reduction
Additional Information: -
Options: Patented IPWet™ Technology 0.05um, 0.07um, 0.1um, 0.2um, 0.3um, 0.5um, 0.7um, 1.0um
Megasonic Cleaner or Dilute HF Buffered Oxide Etch
BuffaEtchTM - III HP / HPX
Features: Highly asymmetric PES with PP support
Benefits: Excellent retention, Excellent flow, Hydrophilic, High purity
Additional Information: -
Options: Cartridge Filter 0.05um, 0.1um